Imec news

Imec installs ASML’s pre-production EUV scanner NXE:3100




28/2/2011

Leuven, Belgium – February 28, 2011 – At today’s SPIE advanced lithography conference, Luc Van den hove, President and CEO of imec, announces during his keynote speech that imec has started the installation of ASML’s pre-production Extreme UltraViolet Lithography (EUVL) scanner, the NXE:3100, in its Leuven facility. The installation of the NXE:3100, featuring a considerably higher source power and optimized optics, underscores imec’s ambition to bring EUVL to production level.

With the installation of ASML’s NXE:3100, imec’s EUVL research program moves to the preproduction stage, shifting the focus from mainly an infrastructure study to include now also a manufacturability study. The NXE:3100 at imec uses a DPP (Discharge Produced Plasma) EUV light source from Xtreme Technologies GmbH (Ushio). At comparable process conditions the NXE:3100 has recently demonstrated a throughput performance increase of a factor of 20 over the EUV Alpha Demo Tool at imec. This increase is based on increased power, higher transmission and dual stages.

Imec’s EUVL research program will tackle scanner-specific issues correlated to the difference between EUV lithography and optical lithography through the integration of 14nm logic and 2xnm and 1xnm memory processes. Research will also focus on resists that allow to optimally exploit the resolution of EUV by tackling line-edge roughness and pattern collapse, and on reticle defectivity.

“We rejoice at the acquisition of ASML’s NXE:3100 in our research facilities as the new tool will enable us to continue to offer our partners the research they need to bring EUVL to production;” said Luc Van den hove, President and CEO at imec. “Our strategic relations with equipment suppliers such as ASML allow us to offer our partners research on the most advanced equipment.”

“As reflected in some of our 28 papers at the SPIE advanced lithography conference this week, together with our partners we have achieved important progress in EUV resists and reticle defectivity;” added Kurt Ronse, director of the lithography department at imec.

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ASML’s NXE:3100 tool on its way to imec Leuven
Caption: ASML’s NXE:3100 tool on its way to imec Leuven.
Click on the picture to download the high-res version.

Movie on the arrival of the NXE:3100 at imec: http://www.youtube.com/imecnanotube


About imec
Imec performs world-leading research in nanoelectronics. Imec leverages its scientific knowledge with the innovative power of its global partnerships in ICT, healthcare and energy. Imec delivers industry-relevant technology solutions. In a unique high-tech environment, its international top talent is committed to providing the building blocks for a better life in a sustainable society. Imec is headquartered in Leuven, Belgium, and has offices in Belgium, the Netherlands, Taiwan, US, China and Japan. Its staff of more than 1,750 people includes over 550 industrial residents and guest researchers. In 2009, imec's revenue (P&L) was 275 million euro. Further information on imec can be found at www.imec.be.
Imec is a registered trademark for the activities of IMEC International (a legal entity set up under Belgian law as a "stichting van openbaar nut”), imec Belgium (IMEC vzw supported by the Flemish Government), imec the Netherlands (Stichting IMEC Nederland, part of Holst Centre which is supported by the Dutch Government), imec Taiwan (IMEC Taiwan Co.) and imec China (IMEC Microelectronics (Shangai) Co. Ltd.).
 
Contact:
Hanne Degans, External Communications Officer, T: +32 16 28 17 69, Mobile: +32 486 065 175, Hanne.Degans@imec.be



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