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ALD workshop

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Atomic layer deposition (ALD)
has evolved over the last 45 years from a laboratory experiment to a technology enabling deposition technique used in the semiconductor, solar, biotechnology industry... ALD is an advanced technique to deposit thin films on a substrate from gas phase precursors. The film is deposited layer by layer through a cyclic process of self-limiting surface reactions. The use of self-limiting surface reactions results in a number of unique features such as growth control at the atomic level enabling nanoscale engineering and tuning of the properties of extremely thin films, as well as conformal deposition on extremely complex nanostructures. The advantages of ALD are increasingly exploited in applications, for example as high-k and metal layers to enhance computer logic and memory chips, passivation layers for solar cells, gas sensing layers, dielectric and electrode deposition for solid state supercapacitors, ...

Many laboratories and research institutes are continuously building up their ALD know-how and exploring new precursors, processes, materials and applications. To promote collaboration and the exchange of knowledge within Europe, as well as to discuss about new trends and opportunities, imec organizes a workshop on the principles and use of ALD. The workshop is organized by Imec Belgium and Imec-NL. The workshop will take place at imec’s research facilities in Leuven, Belgium. The workshop will consist of presentations by invited speakers and an extensive poster session to stimulate discussions between scientists. Everybody is cordially invited to participate by submitting a poster.

The deadline for registration is November 14th. To allow as many people as possible to attend, there will be no registration fee, but registration is mandatory. The workshop will include a complimentary dinner the first day and breakfast the second day.

Keynote presentation:
Jeff Elam, Argonne National Laboratory (US): Beyond A/B/A/B: Unorthodox Pulse Sequences in Atomic Layer Deposition

Confirmed invited speakers: Mikko Ritala/Markku Leskela (University of Helsinki, Finland), Simon Elliott (Tyndall National Institute, Ireland), Harish Parala/Anjana Devi (RUB, Germany), Christophe Detavernier (UGhent, Belgium), Erwin Kessels (TUEindhoven, Netherlands), Mato Knez (Max Planck Institute, Germany), Lina Sarro (Delft University of Technology/DIMES), Fred Roozeboom (TUEindhoven/TNO, Netherlands), Paul Hurley (Tyndall National Institute, Ireland), Uwe Schröder (Namlab, Germany), Johan Swerts (imec), Ola Nilsen (University of Oslo, Norway) .